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1-Methoxy-2-propyl acetate (MPA)

  • Product Name: 1-Methoxy-2-propyl acetate (MPA)
  • CAS: 108-65-6
  • Purity:
  • Appearance: colourless liquid

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  • Molecular Formula:C6H12O3
  • Molecular Weight:132.159
  • Appearance/Colour:colourless liquid 
  • Vapor Pressure:3.7 mm Hg ( 20 °C) 
  • Melting Point:-87 °C 
  • Refractive Index:1.401 - 1.403 
  • Boiling Point:154.8 °C at 760 mmHg 
  • Flash Point:47.9 °C 
  • PSA:35.53000 
  • Density:0.959 g/cm3 
  • LogP:0.58440 

1-Methoxy-2-propyl acetate(Cas 108-65-6) Usage

Flammability and Explosibility

Flammable

Safety Profile

Moderately toxic by intraperitoneal route. Slightly toxic by ingestion and skin contact. When heated to decomposition it emits acrid smoke and irritating vapors.

Application

1-Methoxy-2-propyl acetate is a high-grade industrial solvent with low toxicity and excellent performance. It has strong solubility for polar and non-polar substances. It is suitable for solvents of various polymers of high-grade coatings and inks, including aminomethyl ester, vinyl, polyester, cellulose acetate, alkyd resin, acrylic resin, epoxy resin and nitrocellulose. Among them. Propylene glycol methyl ether propionate is the best solvent in coatings and inks. It is suitable for unsaturated polyester, polyurethane resin, acrylic resin, epoxy resin, etc.

General Description

Propylene glycol monomethyl ether acetate (PGMEA) is a photoresist solvent. Its degradation by microorganisms in different soil types has been investigated. An oral reference dose (RfD) value of PGMEA has been obtained from inhalation studies. The solubility of (5-alkylsulfonyloxyimino-5H-thiophen-2-ylidene)-2-methylphenyl-acetonitriles in PGMEA has been analyzed.

InChI:InChI=1/C5H10O3.C3H6/c1-5(6)8-4-3-7-2;1-3-2/h3-4H2,1-2H3;3H,1H2,2H3

108-65-6 Relevant articles

Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base

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, (2016/05/24)

A photoresist composition containing a p...

A process for the preparation of acetate

-

Paragraph 0061; 0062; 0063; 0064, (2017/01/26)

The invention relates to an acetate prep...

Pattern-forming method, and radiation-sensitive composition

-

, (2016/06/01)

A pattern-forming method includes provid...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND

-

, (2015/11/30)

A radiation-sensitive resin composition ...

108-65-6 Process route

2-(1-methoxycarbonyl-1-methylethylazo)-2-methylpropionic acid methyl ester
2589-57-3

2-(1-methoxycarbonyl-1-methylethylazo)-2-methylpropionic acid methyl ester

propylene glycol methyl ether acetate
108-65-6,142300-82-1

propylene glycol methyl ether acetate

Conditions
Conditions Yield
In methanol; hexane; butanone;
60%
In methanol; hexane; water; butanone;
60%
1-methoxy-2-propanol
107-98-2

1-methoxy-2-propanol

acetic acid
64-19-7,77671-22-8

acetic acid

propylene glycol methyl ether acetate
108-65-6,142300-82-1

propylene glycol methyl ether acetate

Conditions
Conditions Yield
at 98 ℃; under 130.002 Torr; Concentration;

108-65-6 Upstream products

  • 107-98-2
    107-98-2

    1-methoxy-2-propanol

  • 108-24-7
    108-24-7

    acetic anhydride

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    sodium methylate

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    methyloxirane

108-65-6 Downstream products

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    4188-68-5

    methyl (Z)-prop-1-enyl ether

  • 4188-69-6
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    (E)-1-Methoxy-1-propen

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    methylallylether

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    (S)-1-Methoxy-propan-2-ol

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