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Hexamethyldisiloxane (HMDSO)

Product Name: Hexamethyldisiloxane (HMDSO)
CAS: 107-46-0
Purity:
Appearance: Colorless or yellowish transparent liquid

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Product Details

Factory Supply industrial standard Hexamethyldisiloxane (HMDSO) 107-46-0 In Stock

Molecular Formula:C6H18OSi2
Molecular Weight:78.218
Appearance/Colour:Colorless or yellowish transparent liquid
Vapor Pressure:20 hPa (20 °C)
Melting Point:-59 °C
Refractive Index:1.3745 - 1.3750
Boiling Point:100.9 °C at 760 mmHg
Flash Point:7.7 °C
PSA：9.23000
Density:0.79 g/cm³
LogP:2.67280

Hexamethyldisiloxane(Cas 107-46-0) Usage

Chemical Description	Hexamethyldisiloxane is a reducing agent used in combination with P4S10 in the thionation reaction.
Preparation	Synthesis of hexamethyldisiloxane by hydrolysis of trimethylsilyl chloride, water and sodium hydroxide.
Production Methods	Produced via acid hydrolysis of chlorotrimethylsilane and purification by distillation.
Flammability and Explosibility	Highlyflammable
Purification Methods	Fractionally distil through a column packed with glass helices with ca 15 theoretical 20 1.3777. plates. It is highly flammable and is an irritant. [Mills & McKenzie J Am Chem Soc 76 2672 1954, Csakvari et al. J Organometal Chem 107 287 1976, Beilstein 4 IV 4018.]
Physical properties	Hexamethyldisiloxane is a colorless and transparent liquid. It is easily deliquescent, flammable, and has the risk of causing combustion when exposed to high heat, open flame, and strong oxidizing agents. Boiling point 99.5℃. Flash point -1.1℃. Relative density (d2525) 0.7606. refractive index 1.3750. insoluble in water, soluble in many organic solvents.
Definition	ChEBI: Hexamethyldisiloxane is an organosiloxane consisting of two trimethylsilyl groups covalently bound to a central oxygen.
General Description	Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic. Addition of HMDSO to P4S10, improves its efficiency as thionating agent.

InChI:InChI=1/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3

107-46-0 Relevant articles

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107-46-0 Process route

: 2295-12-7
1,1-dimethylsilacyclobutane

: 2370-88-9
2,4,6,8-tetramethylcyclotetrasiloxane

: 1825-61-2
Trimethylmethoxysilane

: 107-46-0
Hexamethyldisiloxane

Conditions

Conditions	Yield
With water; sulfur(VI) hexafluoride; under 30.002 Torr; Product distribution; Mechanism; Irradiation; var. time of irradiation;

: 2295-12-7
1,1-dimethylsilacyclobutane

: 292638-85-8,9003-21-8,96-33-3
acrylic acid methyl ester

: 1627-98-1
1,1,3,3-tetramethyl-1,3-disiletane

: 187737-37-7,13987-01-4,15220-87-8,9003-07-0,676-63-1,25085-53-4
propene

: 74-85-1
ethene

: 1825-62-3
ethyl trimethylsilyl ether

: 107-46-0
Hexamethyldisiloxane

: 541-05-9
Hexamethylcyclotrisiloxane